Carbon-based DLC coating deposited using PACVD technology.
Excellent for all automated machine-related applications thanks to its low-temperature deposition, a friction coefficient among the lowest in PVD coatings, and a high H/E ratio that makes for excellent resistance to wear and fatigue.
Chromium nitride-based coating (CrN) deposited using Carc+ technology – an innovative deposition technique that makes it possible to obtain high-density and highly corrosion-resistant coatings.
Its chemical inertness yields excellent results in reducing the suction effect and sticking, which are typical of injection moulding.
A coating that features special chemical elements in addition to the traditional CrN and NbN nanostructure. The treated surface becomes anti-adhesive and its wear resistance improves greatly thanks to this composition.
Also excellent for mirror-polished surfaces to mould transparent materials.
CATHODIC ARC
Carbon arc refers to a thermal evaporation technique used to evaporate the material that will then be deposited to form the coating. This means that an electric current melts the metal locally, generating ions that are projected outwards.
In the presence of reactive gases, these ions combine to form a plasma that is guided by a magnetic and electric field to build up the coating layer by layer on the substrate.
MAGNETRON SPUTTERING
Magnetron sputtering technology can be used to deposit thin film coatings by creating special conditions inside the coating chamber.
By applying a strong potential difference to the metal target, and in the presence of specific ionizing gases, a plasma can be generated that is capable of ejecting metal ions from the target that then recombine with process gas. This mechanism allows particles to be deposited on the surface of the items until a uniform, compact and dense film is formed.
PACVD
PACVD technology combines a typically physical deposition process with a chemical process. Specifically, while the adhesion and support phases use physical evaporation methods, from actual metal targets, the functional layer of the film is deposited exclusively by the generation of a gaseous plasma.
Unlike the CVD technique, which uses very high temperatures to activate the deposition process, with the PACVD technique, the deposition takes place at very low temperatures, thereby allowing it to be used on a very wide variety of materials.